The Journal of Physical Chemistry C, 22 août 2011, Volume : 115, Numéro : 40
Fabrication of self-assembled arrays of nanocrystals (NCs) by physical vapor deposition (PVD) is a promising technique rated highly for its potential for...
Nanoscale Research Letters, 27 mars 2013, Volume : 8, Numéro : 1
A detailed process characterization of SML electron beam resist for high-aspect-ratio nanopatterning at high sensitivity is presented. SML contrast curves were...
Journal of Visualized Experiments, 20 mars 2015, Volume : 2015, Numéro : 97
Fabrication and characterization of conjugate nano-biological systems interfacing metallic nanostructures on solid supports with immobilized biomolecules is...
2004 MRS Fall Meeting - Symposium KK – Kinetics-Driven Nanopatterning on Surfaces, Cambridge University Press, 2005
We have implemented and investigated numerically a new process to fabricate self-organized metal networks and lines on non-metallic substrates. We have...
Nanotechnology is dependent on nanofabrication techniques to structure matter at the 1–100 nm lengthscale. In this book, a variety of nanofabrication...
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 2011, Volume : 29, Numéro : 6
The authors report a density multiplication process for nanoscale patterns composed of dots and lines using electron beam lithography with low voltage 1 keV...
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 2011, Volume : 29, Numéro : 6
As a low cost and high throughput method for nanoscale pattern replication, step and flash imprint lithography (SFIL) with UV transparent masters is gaining...
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 9 novembre 2012, Volume : 30, Numéro : 6
Exposure of polymethylmethacrylate (PMMA) during electron beam lithography (EBL) produces small polymer fragments that dissolve rapidly during the development...
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 2011, Volume : 29, Numéro : 6
A modern alternative to the positive-tone PMMA resist is the ZEP 520A (Nippon Zeon) brand co-polymer resist, which offers a higher sensitivity and etch...
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